Vacuum exhaust system for CVD equipment (chlorine gas compatible vacuum pump unit)
Proven track record in exhaust for hot CVD equipment. Particularly effective for the exhaust of Cl-based gases, achieving both high-volume exhaust and compatibility with chlorine-based gases. A reliable system that also incorporates gas treatment.
A vacuum pump with a proven track record in chemical processes (water-sealed vacuum pump and mechanical booster) has been integrated into a unit. The pump materials and peripheral equipment are optimized according to the process characteristics, gas types, and exhaust volumes of the CVD equipment. The main exhaust pump is a water-sealed vacuum pump with a liquid circulation system, using an alkaline solution for the circulating sealing liquid, achieving both the exhaust and neutralization of chlorine-based gases. This significantly reduces the load on the downstream gas treatment equipment. It is particularly effective in the exhaust system for chlorine-based gases in thermal CVD equipment for surface treatment, and is widely used in the production of tools, molds, and semiconductor jigs. It can also be applied to the exhaust of chlorine-based gases during Si epitaxial growth and etching. The main pump's water-sealed vacuum pump is also made entirely of stainless steel, providing excellent corrosion resistance in a dedicated vacuum exhaust system.
- Company：神港精機 東京支店
- Price：Other
